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Small-scale research ion beam sputtering device

Experimental device equipped with an ion source, applicable for ultra-thin film multilayer deposition in precision optics.

The "Ion Beam Sputtering Device" from OSI is an experimental device equipped with an ion source that can be customized to meet the usage needs of customers. It demonstrates capabilities equivalent to Veeco's SPECTOR. It uses RF ion sources for sputtering and for assist applications, making it suitable for the deposition of ultra-thin multilayer films in precision optics, equipped with OMS or OTM software. 【Features】 ■ Experimental device equipped with an ion source ■ Equipped with capabilities equivalent to Veeco's SPECTOR ■ Ideal for ultra-thin multilayer film deposition in precision optics with OMS or OTM software ■ Customizable to meet usage needs For more details, please contact us or download the catalog.

  • Sputtering Equipment

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